Jensen Huang Predicts China Will Achieve Advanced Lithography Capability by 2030

NVIDIA CEO Jensen Huang stated at the All-In Summit that China is capable of developing its own advanced lithography systems by 2030. He believes that once the technology matures, China's strong mass production capabilities will allow domestic equipment to enter local wafer fabs. This outlook is more optimistic than that of Frank Rohmund, head of semiconductor at ZEISS, who recently estimated that China might need about 15 years to produce domestic EUV lithography machines.