Samsung and ASML Expand Strategic Partnership for High NA EUV and 12-Inch Photomasks

Samsung Electronics (Samsung Electronics) and ASML (ASML) have announced an expanded strategic partnership focused on high-numerical aperture (High NA) EUV lithography and advanced semiconductor manufacturing. The collaboration aims to develop a next-generation 12-inch photomask platform to replace traditional 6-inch versions, improving production efficiency and reducing costs. Samsung plans to integrate ASML's High NA EUV technology into DRAM mass production by 2028 to extend process roadmaps and streamline manufacturing.