UBS: China Faces Decade-Long Gap in Developing EUV Lithography Alternatives

UBS analysts reported that China is unlikely to develop a viable alternative to ASML's cutting-edge EUV lithography technology within the next decade. The report suggests that China's current technological maturity in light source and laser subsystems is comparable to where ASML stood around 2004, roughly 15 years before the company achieved mass production of EUV equipment. However, UBS expects China to reach mass production capabilities for immersion DUV lithography machines within two to five years. While DUV is less advanced than EUV, it remains essenti